Micromachined submicrometer photodiode for scanning probe microscopy
作者:
R. C. Davis,
C. C. Williams,
P. Neuzil,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 66,
issue 18
页码: 2309-2311
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.114223
出版商: AIP
数据来源: AIP
摘要:
A submicrometer photodiode probe with a sub‐50 nanometer tip radius has been developed for optical surface characterization on a nanometer scale. The nanoprobe is built to detect subwavelength optical intensity variations in the near field of an illuminated surface. The probe consists of an Al–Si Schottky diode constructed near the end of a micromachined pyramidal silicon tip. The process for batch fabrication of the nanoprobes is described. Electrical and optical characterization measurements of the nanoprobe are presented. The diode has a submicrometer optically sensitive area with a 150 fW sensitivity. ©1995 American Institute of Physics.
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