As2S3/GaAs, a new amorphous/crystalline heterojunction for the III‐V semiconductors
作者:
E. Yablonovitch,
T. J. Gmitter,
B. G. Bagley,
期刊:
Applied Physics Letters
(AIP Available online 1990)
卷期:
Volume 57,
issue 21
页码: 2241-2243
ISSN:0003-6951
年代: 1990
DOI:10.1063/1.104163
出版商: AIP
数据来源: AIP
摘要:
Much of the technology of our era is based on the SiO2/Si amorphous/crystalline heterojunction interface. Now it appears that As2S3/GaAs amorphous/crystalline heterojunctions show some technological promise. We have found that properly prepared As2S3/GaAs interfaces can have reasonably good electronic quality. The interfacial recombination velocity is ≊15 000 cm/s at flat band, which results in a ∼100‐fold reduction of perimeter recombination currents inp‐njunction mesas. This can be important on heterojunction transistor emitter‐base perimeters, solar cell and light‐emitting diode perimeters, and for reducing mirror facet recombination in semiconductor lasers.
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