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Nanometer scale conductance change in a Langmuir‐Blodgett film with the atomic force microscope

 

作者: Koji Yano,   Masafumi Kyogaku,   Ryo Kuroda,   Yasuhiro Shimada,   Shunichi Shido,   Hiroshi Matsuda,   Kiyoshi Takimoto,   Otto Albrecht,   Ken Eguchi,   Takashi Nakagiri,  

 

期刊: Applied Physics Letters  (AIP Available online 1996)
卷期: Volume 68, issue 2  

页码: 188-190

 

ISSN:0003-6951

 

年代: 1996

 

DOI:10.1063/1.116455

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A nanometer scale metal/Langmuir‐Blodgett (LB) film/metal structure is realized with an atomic force microscope combined with scanning tunneling microscope (AFM/STM). Even in this nanometer scale configuration, increase in conductance can be induced at any point in the LB film by application of a voltage pulse. The AFM/STM observation shows little surface modification has occurred by the voltage application, which shows that the conductance of the LB film changes without pit formation in the LB film or metal cluster deposition from the tip of the probe. ©1996 American Institute of Physics.

 

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