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Heat Treatment Centers and Bulk Currents in Siliconp‐nJunctions

 

作者: D. J. Sandiford,  

 

期刊: Journal of Applied Physics  (AIP Available online 1959)
卷期: Volume 30, issue 12  

页码: 1981-1986

 

ISSN:0021-8979

 

年代: 1959

 

DOI:10.1063/1.1735101

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A set of small‐area, alloy,p‐njunction diodes was made from a slice of heat‐treatedn‐type silicon. The carrier lifetimes of the diodes were found to be in the range of 2.5×10−8sec to 3.5×10−6sec. Measurements were made of the lifetime and of the current‐voltage characteristics in the forward and reverse directions as a function of temperature from room temperature to 165°C. An analysis of the results and, in particular, the correlation of current flow with lifetime values, showed that for the diodes with the shortest lifetimes, centers situated 0.48 ev at 0°K from either the conduction or valence bands were responsible for large space‐charge currents. For the diodes with lifetimes in the microsecond range, surface leakage currents were predominant. Evidence was found of a field‐dependent emission probability, &bgr;, for these centers. The results showed that &bgr;∼E0.35whenE, the electric field, is in the range of 2×104to 8×104v/cm.

 

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