Misfit dislocations and stresses in GaN epilayers
作者:
Junyong Kang,
Tomoya Ogawa,
期刊:
Applied Physics Letters
(AIP Available online 1997)
卷期:
Volume 71,
issue 16
页码: 2304-2306
ISSN:0003-6951
年代: 1997
DOI:10.1063/1.120056
出版商: AIP
数据来源: AIP
摘要:
GaN epilayers nitridated initially for different times have been investigated by light scattering tomography (LST) and Raman scattering. In the LST images of the plan-view epilayers, the light scattering defects mainly distribute in 〈112_0〉 directions. The density of the defects is lower in epilayer nitridated initially for a longer time. The defects are considered to be the straight threading edge dislocations on {11_00} planes. The Raman shift ofE2mode is larger in the sample initially nitridated for a longer time. Our results show that the misfit between the GaN epilayer and theAl2O3substrate is more unfavorably accommodated by the threading edge dislocations in the epilayers initially nitridated for a longer time. ©1997 American Institute of Physics.
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