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Misfit dislocations and stresses in GaN epilayers

 

作者: Junyong Kang,   Tomoya Ogawa,  

 

期刊: Applied Physics Letters  (AIP Available online 1997)
卷期: Volume 71, issue 16  

页码: 2304-2306

 

ISSN:0003-6951

 

年代: 1997

 

DOI:10.1063/1.120056

 

出版商: AIP

 

数据来源: AIP

 

摘要:

GaN epilayers nitridated initially for different times have been investigated by light scattering tomography (LST) and Raman scattering. In the LST images of the plan-view epilayers, the light scattering defects mainly distribute in ⟨112_0⟩ directions. The density of the defects is lower in epilayer nitridated initially for a longer time. The defects are considered to be the straight threading edge dislocations on {11_00} planes. The Raman shift ofE2mode is larger in the sample initially nitridated for a longer time. Our results show that the misfit between the GaN epilayer and theAl2O3substrate is more unfavorably accommodated by the threading edge dislocations in the epilayers initially nitridated for a longer time. ©1997 American Institute of Physics.

 

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