The structure of plasma‐deposited silicon nitride films determined by infrared spectroscopy
作者:
W. R. Knolle,
J. W. Osenbach,
期刊:
Journal of Applied Physics
(AIP Available online 1985)
卷期:
Volume 58,
issue 3
页码: 1248-1254
ISSN:0021-8979
年代: 1985
DOI:10.1063/1.336116
出版商: AIP
数据来源: AIP
摘要:
Plasma‐deposited silicon nitride,a‐SiN:H, has been deposited at low ammonia‐to‐silane gas ratios. The nitrogen‐to‐silicon ratio in the film is proportional to the NH3/SiH4flow ratio in the reactor. The Si‐H peak in the infrared spectrum of thea‐SiN:H shifts to lower frequency as the N/Si of the film decreases. We use the random bonding model to calculate the average electronegativity that a Si‐H bond experiences for a particular N/Si ratio in the film. The measured Si‐H frequency correlates with the calculated electronegativities and agrees with a similar correlation of Si‐H obtained for molecules. For N/Si less than 0.27 we observe an additional peak at 650 cm−1that also appears in the spectrum of plasma‐deposited amorphous Si and is the Si‐H wagging vibration. The random bonding model predicts amorphous Si to be the predominant constituent for N/Si less than 0.27, in agreement with the infrared data.
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