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Nanoscale freestanding gratings for ultraviolet blocking filters

 

作者: J. T. M. van Beek,   R. C. Fleming,   P. S. Hindle,   J. D. Prentiss,   M. L. Schattenburg,   S. Ritzau,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  (AIP Available online 1998)
卷期: Volume 16, issue 6  

页码: 3911-3916

 

ISSN:1071-1023

 

年代: 1998

 

DOI:10.1116/1.590434

 

出版商: American Vacuum Society

 

关键词: ULTRAVIOLET RADIATION;OPTICAL FILTERS;GRATINGS;FABRICATION;SIGNAL-TO-NOISE RATIO;ETCHING;ELECTROPLATING

 

数据来源: AIP

 

摘要:

Ultraviolet (UV) blocking filters are needed for atomic flux imaging in environments where high levels of ultraviolet radiation are present. Freestanding gratings are a promising candidate for UV filtering. They have a high aspect ratio (∼13), narrow (∼40 nm) slots, and effectively block UV radiation. The grating fabrication process makes use of several etching, electroplating, and lithographic steps and includes an optional step to plug pinholes induced by particles during processing. Gratings were successfully manufactured and tested. Measured UV transmissions of∼10−5and particle transmissions of ∼10% are in agreement with theoretical predictions.

 

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