Nanoscale freestanding gratings for ultraviolet blocking filters
作者:
J. T. M. van Beek,
R. C. Fleming,
P. S. Hindle,
J. D. Prentiss,
M. L. Schattenburg,
S. Ritzau,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1998)
卷期:
Volume 16,
issue 6
页码: 3911-3916
ISSN:1071-1023
年代: 1998
DOI:10.1116/1.590434
出版商: American Vacuum Society
关键词: ULTRAVIOLET RADIATION;OPTICAL FILTERS;GRATINGS;FABRICATION;SIGNAL-TO-NOISE RATIO;ETCHING;ELECTROPLATING
数据来源: AIP
摘要:
Ultraviolet (UV) blocking filters are needed for atomic flux imaging in environments where high levels of ultraviolet radiation are present. Freestanding gratings are a promising candidate for UV filtering. They have a high aspect ratio (∼13), narrow (∼40 nm) slots, and effectively block UV radiation. The grating fabrication process makes use of several etching, electroplating, and lithographic steps and includes an optional step to plug pinholes induced by particles during processing. Gratings were successfully manufactured and tested. Measured UV transmissions of∼10−5and particle transmissions of ∼10% are in agreement with theoretical predictions.
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