The wall‐motion fieldHcin an as‐polished orthoferrite platelet is generally too large (Hc>0.5 Oe) for use in domain propagation devices without further treatment. Very low values ofHcdown to less than 0.02 Oe have previously been reported by Heinlein and Pierce1using a 1500°C anneal in a highly purified atmosphere. We find that a simple anneal at 1200°C for one hour in ambient atmosphere produces samples havingHcof 0.25–0.50 Oe, but this is sufficiently low to demonstrate device operation. The annealing treatment was successful with samples mechanically polished by various methods including samples which were also etched in 250°C phosphoric acid. Temperatures lower than 1200°C do not lowerHcsufficiently, and somewhat higher annealing temperatures lead to no further improvement. Annealing times longer than an hour do not lead to improvement inHcand may cause surface damage. This simple technique has proven useful in obtaining samples for initial studies on domain propagation and device design.