Study on ferroelectric thin films for application to NDRO non-volatile memories
作者:
Yuichi Nakao,
Takashi Nakamura,
Akira Kamisawa,
Hidemi Takasu,
期刊:
Integrated Ferroelectrics
(Taylor Available online 1995)
卷期:
Volume 6,
issue 1-4
页码: 23-34
ISSN:1058-4587
年代: 1995
DOI:10.1080/10584589508019351
出版商: Taylor & Francis Group
数据来源: Taylor
摘要:
In this paper we describe an experimental study on ferroelectric non-volatile memory. The test devices using a MFMIS (metal-ferroelectric-metal-insulator-semiconductor) structure were developed for 1-Tr-type NDRO (non-destructive readout) memory. PZT (Lead-zirconate-titanate) and PT (lead-titanate) thin films were deposited on various bottom electrodes by solgel method. As electrodes, Pt, Pt/Ti, Pt/Ti/Ta and Pt/IrO2were deposited by RF magnetron sputtering. We found out that a variation in the electrodes caused drastic changes in the C-V characteristics and fatigue characteristics of MFMIS capacitors. The I-V characteristics of Pt/PZT/ Pt/SiO2/p-Si MFMIS FET showed a hysteresis loop and the direction of the loop corresponded to ferroelectric polarization in the PZT film. A 2.7 V memory window was achieved using a 6 V programming voltage. PZT thin films on Pt/IrO2electrodes showed no fatigue after 1012switching cycles.
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