Threshold of a thallium‐iodide photodissociation laser operated at low pressure
作者:
P.‐D. Henchoz,
W. Lu¨thy,
R. Schmiele,
期刊:
Journal of Applied Physics
(AIP Available online 1982)
卷期:
Volume 53,
issue 12
页码: 8451-8453
ISSN:0021-8979
年代: 1982
DOI:10.1063/1.330493
出版商: AIP
数据来源: AIP
摘要:
The emission intensity of the 535‐nm line of a thallium‐iodide photodissociation laser excited with 193‐nm ultraviolet radiation is measured as a function of pump energy and vapor pressure. Pressure was varied between 4×10−5and 0.13 Torr. No threshold for positive gain has been found experimentally. The measurements and computer simulation indicate a possibility of constructing lasers with extremely low excitation energy.
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