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Threshold of a thallium‐iodide photodissociation laser operated at low pressure

 

作者: P.‐D. Henchoz,   W. Lu¨thy,   R. Schmiele,  

 

期刊: Journal of Applied Physics  (AIP Available online 1982)
卷期: Volume 53, issue 12  

页码: 8451-8453

 

ISSN:0021-8979

 

年代: 1982

 

DOI:10.1063/1.330493

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The emission intensity of the 535‐nm line of a thallium‐iodide photodissociation laser excited with 193‐nm ultraviolet radiation is measured as a function of pump energy and vapor pressure. Pressure was varied between 4×10−5and 0.13 Torr. No threshold for positive gain has been found experimentally. The measurements and computer simulation indicate a possibility of constructing lasers with extremely low excitation energy.

 

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