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Photocapacitance study of deep levels due to nonstoichiometry in nitrogen‐free GaP light‐emitting diodes

 

作者: J. Nishizawa,   Y. J. Shi,   K. Suto,   M. Koike,  

 

期刊: Journal of Applied Physics  (AIP Available online 1982)
卷期: Volume 53, issue 5  

页码: 3878-3883

 

ISSN:0021-8979

 

年代: 1982

 

DOI:10.1063/1.331088

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Photocapacitance spectra of the excitation probability of electrons (or holes) occupied in deep levels have been measured for S‐ and Te‐doped nitrogen‐free GaP light‐emitting diodes grown by temperature difference method of liquid phase epitaxy under various phosphorus pressures in the vicinity of the optimum pressure (Popt). A band at 2.00 eV observed for the diodes grown under phosphorus pressures higher thanPoptis attributed to interstitial phosphorus atoms. On the other hand, bands at 2.10 and 2.20 eV which were observed, respectively, in the spectra of S‐ and Te‐doped diodes grown under phosphorus pressure lower thanPoptare attributed to complex centers of phosphorus vacancies and donors.

 

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