Nano‐scratch study of molecular deposition films on silicon wafers using nano‐indentation
作者:
Wang Deguo,
Zhang Siwei,
Gao Manglai,
期刊:
Tribotest
(WILEY Available online 2003)
卷期:
Volume 9,
issue 3
页码: 231-237
ISSN:1354-4063
年代: 2003
DOI:10.1002/tt.3020090306
出版商: John Wiley&Sons, Ltd
关键词: molecular deposition;MD films;silicon wafer;nano‐indentation;critical load;friction
数据来源: WILEY
摘要:
AbstractExperiments on molecular deposition (MD) films with and without alkyl terminal groups deposited on silicon wafers were conducted using nano‐indentation. It was found that MD films and alkyl‐terminated MD films exhibit a higher critical load and a lower coefficient of friction than the silicon substrate. The critical load increases with the number of layers, and the coefficients of friction of MD films with alkyl terminal groups are lower than those of the corresponding MD films with the same number of layers but without alkyl terminal gro
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