Photovoltage generation of Si/C60heterojunction
作者:
K. Kita,
C. Wen,
M. Ihara,
K. Yamada,
期刊:
Journal of Applied Physics
(AIP Available online 1996)
卷期:
Volume 79,
issue 5
页码: 2798-2800
ISSN:0021-8979
年代: 1996
DOI:10.1063/1.361114
出版商: AIP
数据来源: AIP
摘要:
Photovoltage generation was observed for C60/Si heterojunction fabricated by the deposition of C60thin film on Si substrate. Four types of Si substrates (two forp‐type and two forn‐type) were used. All junctions showed rectifying behaviors and photovoltage generation under illumination of Ar‐ion laser. The highest value of the photovoltage was 0.40 V. From the saturated photovoltage values for four junctions, the Fermi level of C60thin film was estimated to be located about 4.7 eV below the vacuum level. ©1996 American Institute of Physics.
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