Poly(silamine)s as new electron‐beam resist materials
作者:
Yukio Nagasaki,
Noriyuki Yamazaki,
Ken‐Ichiro Deguchi,
Masao Kato,
期刊:
Macromolecular Rapid Communications
(WILEY Available online 1996)
卷期:
Volume 17,
issue 1
页码: 51-58
ISSN:1022-1336
年代: 1996
DOI:10.1002/marc.1996.030170108
出版商: Hüthig&Wepf Verlag
数据来源: WILEY
摘要:
AbstractSeveral types of poly(silamine)s were prepared and their structure‐characteristics relationships were investigated. When a phenyl ring in the organosilyl unit and/or a cyclic structure in the amino unit was introduced, the glass transition temperatures were increased significantly in order to increase film formability. From the thermogravimetric analysis of the poly(silamine)s, it was found that the thermal decomposition of poly(silamine)s starts at ca. 380–400°C. On electron‐beam irradiation of the poly(silamine) films, degradation of the polymer took place. On the basis of these results, poly(silamine)s can be one of the candidates for new positive‐type polymeric
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