The coupling of laser ablation systems with inductively coupled plasma (ICP) mass spectrometry has been done for many years, however the quantitative aspects as well as the applications have often been limited. Recently, LA ICP‐MS has been developed into a valuable analytical tool in our laboratory to address new applications, and some experimental difficulties encountered by SEM‐EDX and SIMS in characterizing solid semiconductor, electronic, and optical communication materials. In this paper we will discuss many of the applications as well as the pros, cons, and complementary features of the laser ablation technique as it relates to electronics industry issues. © 2003 American Institute of Physics