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Silicide films for archival optical storage

 

作者: K. N. Tu,   K. Y. Ahn,   S. R. Herd,  

 

期刊: Applied Physics Letters  （AIP Available online 1981）
卷期: Volume 39, issue 11  

页码: 927-929

 

ISSN:0003-6951

 

年代: 1981

 

DOI:10.1063/1.92609

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We demonstrate here that bilayer films consisting of Si and transition metals with a layer thickness of 15–40 nm are promising materials for archival optical storage. They show a large optical reflectivity change before and after silicide formation, have a long lifetime at room temperature, and are nontoxic.

 

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