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Analysis of ion implanted diamond

 

作者: L.A. Davidson,   S. Chou,   J.F. Gibbons,   W.S. Johnson,  

 

期刊: Radiation Effects  (Taylor Available online 1971)
卷期: Volume 7, issue 1-2  

页码: 35-44

 

ISSN:0033-7579

 

年代: 1971

 

DOI:10.1080/00337577108232562

 

出版商: Taylor & Francis Group

 

数据来源: Taylor

 

摘要:

Ion implantation allows controlled introduction of impurities into diamond. A basic problem is to determine if the implanted layers are dominated by substitutional doping or radiation damage effects. Optical and electrical measurements on the implanted diamonds revealed (1) a degradation of the band-gap and sample coloration, (2) no optical absorption levels which would be characteristic of hydrogenic ionization levels, (3) resistivity activation energies of 0.2 to 0.3 eV independent of the ion specie, and (4) no measurable Hall Effect.

 

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