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Characterization of a permanent magnet electron cyclotron resonance plasma source

 

作者: T. D. Mantei,   S. Dhole,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  （AIP Available online 1991）
卷期: Volume 9, issue 1  

页码: 26-28

 

ISSN:1071-1023

 

年代: 1991

 

DOI:10.1116/1.585785

 

出版商: American Vacuum Society

 

关键词: PLASMA SOURCES;ETCHING;DESIGN;FABRICATION;PERMANENT MAGNETS;NEODYMIUM ALLOYS;IRON ALLOYS;BORON ALLOYS;MICROWAVE RADIATION;ELECTRON CYCLOTRON−RESONANCE;SILICON;ARGON;SULFUR FLUORIDES;MEDIUM VACUUM;POWER RANGE 100−1000 W

 

数据来源: AIP

 

摘要:

Experimental details and results are presented for a permanent magnet electron cyclotron resonance plasma source matched to a multipolar confined process chamber. A Nd–Fe–B magnet structure provides a resonant axial magnetic field with no electrical or cooling input power, replacing the more typical current driven coils. Plasma parameter and etch characterization measurements in Ar and SF6are presented for the pressure range 0.1–1.0 mTorr and input microwave power levels 100–500 W.

 

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