The Hall and the magnetoresistive effect of amorphous Fe‐Si films
作者:
Y. Shimada,
H. Kojima,
期刊:
Journal of Applied Physics
(AIP Available online 1978)
卷期:
Volume 49,
issue 2
页码: 932-933
ISSN:0021-8979
年代: 1978
DOI:10.1063/1.324631
出版商: AIP
数据来源: AIP
摘要:
Measurements on the Hall and the magnetoresistive effect in Fe‐Si amorphous films are described. The spontaneous Hall constantRsincreases as the Si content increases. A sensitive irreversible change ofRswas observed by annealing.Rsincreases by crystallization. The magnetoresistive effect &Dgr;&rgr;/&rgr; is low but &Dgr;&rgr; is comparable to those of Fe‐Ni crystalline alloys.
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