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The Hall and the magnetoresistive effect of amorphous Fe‐Si films

 

作者: Y. Shimada,   H. Kojima,  

 

期刊: Journal of Applied Physics  (AIP Available online 1978)
卷期: Volume 49, issue 2  

页码: 932-933

 

ISSN:0021-8979

 

年代: 1978

 

DOI:10.1063/1.324631

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Measurements on the Hall and the magnetoresistive effect in Fe‐Si amorphous films are described. The spontaneous Hall constantRsincreases as the Si content increases. A sensitive irreversible change ofRswas observed by annealing.Rsincreases by crystallization. The magnetoresistive effect &Dgr;&rgr;/&rgr; is low but &Dgr;&rgr; is comparable to those of Fe‐Ni crystalline alloys.

 

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