Model diffraction profiles parallel to rough step edges
作者:
R. Kariotis,
B. S. Swartzentruber,
M. G. Lagally,
期刊:
Journal of Applied Physics
(AIP Available online 1990)
卷期:
Volume 67,
issue 6
页码: 2848-2852
ISSN:0021-8979
年代: 1990
DOI:10.1063/1.345454
出版商: AIP
数据来源: AIP
摘要:
Modeling of rough step edges has been made and compared with scanning tunneling microscopy (STM) micrographs. In this paper, we use a phenomenological Hamiltonian to calculate diffraction profiles which can be used to determine the extent of step‐edge meandering. Comparison with experiment is made based on a parametrization of the step statistics obtained from STM data of silicon (001) step edges.
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