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Extrapolated and Projected Ranges of 4‐ to 24‐MeV Electrons in Elemental Materials

 

作者: Tatsuo Tabata,   Rinsuke Ito,   Shigeru Okabe,   Yoshiaki Fujita,  

 

期刊: Journal of Applied Physics  (AIP Available online 1971)
卷期: Volume 42, issue 9  

页码: 3361-3366

 

ISSN:0021-8979

 

年代: 1971

 

DOI:10.1063/1.1660737

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The extrapolated rangeRexand the projected rangeRprof 4‐ to 24‐MeV electrons in Be, Al, Cu, Ag, and Au have been determined from the experimental data for the charge‐deposition distribution produced by the electrons in the effectively semiinfinite absorber. While the results forRexshow no significant difference from the data obtained by Harder and Poschet and by Ebertet al.for the absorber configuration of finite slab, the present values ofRprfor the absorbers of high atomic number are slightly smaller than the results of Harder and Poschet. In the energy region considered here,Rexhas been found to obey an empirical equation of the formRex=A(E0−B)C, whereA, B, andCare expressed by simple functions of atomic number, andE0is the incident kinetic energy of the electron. A semiempirical relation previously found betweenRprand the continuous slowing‐down approximation rangeR0has been modified so as to show a better agreement with the present data.

 

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