AgCl Intrinsic properties modifications by ion implantation
作者:
J.L. Gisclon,
J. Bert,
L. Vignal,
Ch. Diaine,
J. Dupuy,
期刊:
Radiation Effects
(Taylor Available online 1982)
卷期:
Volume 64,
issue 1-4
页码: 125-134
ISSN:0033-7579
年代: 1982
DOI:10.1080/00337578208223003
出版商: Taylor & Francis Group
数据来源: Taylor
摘要:
The damage produced by energetic ion implantation (100 keV < E < l MeV) in AgCl (single crystals or thin films) is mainly due to the Ag+sublattice. At liquid nitrogen temperature (LNT), the photographic process being blocked, the main defects created are identified as silver clusters. Their formation is analysed by means of the study of optical absorption spectra; this method permits cluster characterization with respect to elastic collision energy.
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