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AgCl Intrinsic properties modifications by ion implantation

 

作者: J.L. Gisclon,   J. Bert,   L. Vignal,   Ch. Diaine,   J. Dupuy,  

 

期刊: Radiation Effects  (Taylor Available online 1982)
卷期: Volume 64, issue 1-4  

页码: 125-134

 

ISSN:0033-7579

 

年代: 1982

 

DOI:10.1080/00337578208223003

 

出版商: Taylor & Francis Group

 

数据来源: Taylor

 

摘要:

The damage produced by energetic ion implantation (100 keV < E < l MeV) in AgCl (single crystals or thin films) is mainly due to the Ag+sublattice. At liquid nitrogen temperature (LNT), the photographic process being blocked, the main defects created are identified as silver clusters. Their formation is analysed by means of the study of optical absorption spectra; this method permits cluster characterization with respect to elastic collision energy.

 

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