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Modeling negative ion production in volume sources

 

作者: Osamu Fukumasa,   Kyogo Yoshino,  

 

期刊: AIP Conference Proceedings  (AIP Available online 1998)
卷期: Volume 439, issue 1  

页码: 54-61

 

ISSN:0094-243X

 

年代: 1998

 

DOI:10.1063/1.56354

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Effects of cesium vapor injection onH−production in a tandem volume source are studied numerically as a function of plasma parameters. Model calculation is performed by solving a set of particle balance equations for steady-state hydrogen discharge plasmas. Here, the results with a focus on electron temperature and gas pressure dependence onH−volume production are presented and discussed. ConsideringH−surface production due to H atoms and positive hydrogen ions, enhancement ofH−production and pressure dependence ofH−production observed experimentally are qualitatively well reproduced in the model calculation, where stripping loss in the extraction and acceleration regions is taken into account. For enhancement ofH−production, so-called electron cooling is not very effective if plasma parameters are initially optimized with the use of a magnetic filter. ©1998 American Institute of Physics.

 

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