首页   按字顺浏览 期刊浏览 卷期浏览 Thermal and Electrical Properties of Heavily Doped Ge‐Si Alloys up to 1300°K
Thermal and Electrical Properties of Heavily Doped Ge‐Si Alloys up to 1300°K

 

作者: J. P. Dismukes,   L. Ekstrom,   E. F. Steigmeier,   I. Kudman,   D. S. Beers,  

 

期刊: Journal of Applied Physics  (AIP Available online 1964)
卷期: Volume 35, issue 10  

页码: 2899-2907

 

ISSN:0021-8979

 

年代: 1964

 

DOI:10.1063/1.1713126

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The thermal resistivity, Seebeck coefficient, electrical resistivity, and Hall mobility of Ge‐Si alloys have been measured throughout the Ge‐Si alloy system as functions of impurity concentration in the range 2×1018−4×1020cm−3, and of temperature in the range 300°–1300°K. A qualitative interpretation of these properties is given. For power conversion, boron and phosphorus were found to be usefulp‐type andn‐type impurities, respectively, because of their high solid solubilities. At 1200°K, the maximum values of the dimensionless figure of meritzTwere 0.8 forp‐type Ge0.15‐Si0.85alloy doped to 2.1×1020cm−3holes, and 1.0 forn‐type Ge0.15‐Si0.85alloy doped to 2.7×1020cm−3electrons. The maximum over‐all efficiency of a stable generator operating between 300°–1200°K, using the bestp‐type andn‐type materials was computed to be 10%.

 

点击下载:  PDF (634KB)



返 回