Mechanism of a hydrogenating polycrystalline silicon in hydrogen plasma annealing
作者:
Kenji Nakazawa,
Hitoshi Arai,
Shigeto Kohda,
期刊:
Applied Physics Letters
(AIP Available online 1987)
卷期:
Volume 51,
issue 20
页码: 1623-1625
ISSN:0003-6951
年代: 1987
DOI:10.1063/1.98575
出版商: AIP
数据来源: AIP
摘要:
The hydrogenation mechanism has been studied in the hydrogen plasma annealing of a polycrystalline silicon (polysilicon). Hydrogen depth profile measurements reveal that hydrogen atoms are introduced into the polysilicon by diffusion in which the diffusion constant and the surface density of hydrogen atoms increase as the rf power rises. The density of dangling bonds measured by electron spin resonance (ESR) shows that hydrogen atoms passivate dangling bonds more effectively with a higher rf power. By using the polysilicon hydrogenated at various rf powers, thin‐film transistors (TFT’s) have been fabricated to investigate the effect of hydrogenation on the TFT field‐effect mobility. The results show that hydrogen plasma annealing with a rf power of 50 W increases the field‐effect mobility. However, a decrease of the field‐effect mobility, which is considered to be caused by plasma induced surface damage, is also observed when the rf power is higher than 50 W.
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