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Calculation of the electron velocity distribution in high electron mobility transistors using an ensemble Monte Carlo method

 

作者: T. Wang,   K. Hess,  

 

期刊: Journal of Applied Physics  (AIP Available online 1985)
卷期: Volume 57, issue 12  

页码: 5336-5339

 

ISSN:0021-8979

 

年代: 1985

 

DOI:10.1063/1.334851

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The electron velocity distribution is calculated for an idealized model of the high electron mobility transistor using a many‐particle Monte Carlo model and a self‐consistent two‐dimensional Poisson solver. Hot electron effects, nonstationary effects, and real space transfer are analyzed. The results show that significant velocity overshoot, 2.8×107cm/s at 300 K and 3.7×107cm/s at 77 K exists under the gate and that the velocity overshoot is limited by bothk‐space transfer and real‐space transfer. The values of the overshoot velocities are much smaller than those obtained from the more conventional drift‐diffusion model.

 

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