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Hall mobility lowering in undopedn-type bulk GaAs due to cellular-structure related nonuniformities

 

作者: W. Siegel,   S. Schulte,   G. Ku¨hnel,   J. Monecke,  

 

期刊: Journal of Applied Physics  (AIP Available online 1997)
卷期: Volume 81, issue 7  

页码: 3155-3159

 

ISSN:0021-8979

 

年代: 1997

 

DOI:10.1063/1.364350

 

出版商: AIP

 

数据来源: AIP

 

摘要:

In undoped bulk-grown GaAs single crystals, which show a wide variation of the resistivity, a characteristic dependence of the Hall mobility on the carrier concentration with a pronounced minimum at about1×1010 cm−3is observed. By applying a standard effective medium theory it is shown that this minimum is caused by mesoscopic nonuniformities of the charge carrier concentration and not by increased scattering rates or additional scattering mechanisms as would be the standard interpretation in the case of homogeneous samples. These nonuniformities observed by high-resolution point-contact measurements are connected with the cellular structure of dislocations. ©1997 American Institute of Physics.

 

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