Resist heating effect in electron beam lithography
作者:
M. Yasuda,
H. Kawata,
K. Murata,
K. Hashimoto,
Y. Hirai,
N. Nomura,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1994)
卷期:
Volume 12,
issue 3
页码: 1362-1366
ISSN:1071-1023
年代: 1994
DOI:10.1116/1.587299
出版商: American Vacuum Society
关键词: LITHOGRAPHY;ELECTRON BEAMS;TEMPERATURE DISTRIBUTION;PHOTORESISTS;HEATING;resists
数据来源: AIP
摘要:
Resist heating effects on pattern shapes in electron beam lithography have been studied. The beam current density and dose partition dependences of the pattern shape are explained by comparison between the calculated spatial distribution of resist temperature and experimental resist pattern profiles. From direct heating of the resist using a tungsten heater during electron beam irradiation, the temperature effect on the resist sensitivity and pattern shape has been investigated. The pattern shape distortion is evaluated by a simulation considering the temperature effect.
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