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Silicon Crystal Termination—An Application of ANOM for Percent Defective Data

 

作者: TomlinsonLowell H.,   LavignaRobert J.,  

 

期刊: Journal of Quality Technology  (Taylor Available online 1983)
卷期: Volume 15, issue 1  

页码: 26-32

 

ISSN:0022-4065

 

年代: 1983

 

DOI:10.1080/00224065.1983.11978838

 

出版商: Taylor&Francis

 

关键词: Analysis of Means;Attribute Data;Crystal Growing;Termination

 

数据来源: Taylor

 

摘要:

The late Dr. Ellis R. Ott has erected his own memorial by providing quality control practitioners with a useful tool for the direct graphical comparison of means. This paper discusses the application of his technique to the first processing step in semiconductor manufacturing. In particular, a simple dichotomous parameter is selected for analysis to demonstrate that significant gains can be realized when this appealing statistical procedure is coupled with quality team involvement.

 

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