Silicon Crystal Termination—An Application of ANOM for Percent Defective Data
作者:
TomlinsonLowell H.,
LavignaRobert J.,
期刊:
Journal of Quality Technology
(Taylor Available online 1983)
卷期:
Volume 15,
issue 1
页码: 26-32
ISSN:0022-4065
年代: 1983
DOI:10.1080/00224065.1983.11978838
出版商: Taylor&Francis
关键词: Analysis of Means;Attribute Data;Crystal Growing;Termination
数据来源: Taylor
摘要:
The late Dr. Ellis R. Ott has erected his own memorial by providing quality control practitioners with a useful tool for the direct graphical comparison of means. This paper discusses the application of his technique to the first processing step in semiconductor manufacturing. In particular, a simple dichotomous parameter is selected for analysis to demonstrate that significant gains can be realized when this appealing statistical procedure is coupled with quality team involvement.
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