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GaP1−xNxalloys formed by ion implantation

 

作者: Xizhen Yang,   Zhenjin Lin,   Zhigang Li,   Liu Wu,   Chenjie Mao,  

 

期刊: Journal of Applied Physics  (AIP Available online 1995)
卷期: Volume 77, issue 11  

页码: 5553-5557

 

ISSN:0021-8979

 

年代: 1995

 

DOI:10.1063/1.359195

 

出版商: AIP

 

数据来源: AIP

 

摘要:

GaP1−xNxalloys (x=0.02–0.07 andx&bartil;0.99) have been formed by ion implantation of Ga+and N+into GaP. X‐ray diffraction measurements proved that both a wurtzite structure and a zincblende structure of the crystals have been formed within the implanted layers. They are similar to but not the same as GaN and GaP, respectively. An emission band at an energy higher than the energy gap of GaP appeared on the photoluminescence (PL) spectra of the implanted layers and consists of several components. Formation of the alloy and origins of the PL components are discussed. ©1995 American Institute of Physics.

 

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