GaP1−xNxalloys formed by ion implantation
作者:
Xizhen Yang,
Zhenjin Lin,
Zhigang Li,
Liu Wu,
Chenjie Mao,
期刊:
Journal of Applied Physics
(AIP Available online 1995)
卷期:
Volume 77,
issue 11
页码: 5553-5557
ISSN:0021-8979
年代: 1995
DOI:10.1063/1.359195
出版商: AIP
数据来源: AIP
摘要:
GaP1−xNxalloys (x=0.02–0.07 andx&bartil;0.99) have been formed by ion implantation of Ga+and N+into GaP. X‐ray diffraction measurements proved that both a wurtzite structure and a zincblende structure of the crystals have been formed within the implanted layers. They are similar to but not the same as GaN and GaP, respectively. An emission band at an energy higher than the energy gap of GaP appeared on the photoluminescence (PL) spectra of the implanted layers and consists of several components. Formation of the alloy and origins of the PL components are discussed. ©1995 American Institute of Physics.
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