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Structural and dielectric properties of Ba0.5Sr0.5TiO3thin films with an epi-RuO2bottom electrode

 

作者: Q.X. Jia,   A.T. Findikoiglu,   R. Zhou,   S.R. Foltyn,   X.D. Wu,   J.L. Smith,   Q. Wang,   D.F. Evans,   W.L. Gladfelter,  

 

期刊: Integrated Ferroelectrics  (Taylor Available online 1998)
卷期: Volume 19, issue 1-4  

页码: 111-119

 

ISSN:1058-4587

 

年代: 1998

 

DOI:10.1080/10584589808012698

 

出版商: Taylor & Francis Group

 

关键词: DRAMs;BSTO;thin film

 

数据来源: Taylor

 

摘要:

Epitaxial conductive RuO2thin films were used as bottom electrodes of Ba0.5Sr0.5TiO3(BSTO) thin-film capacitors. The BSTO showed pure (111) orientation normal to the substrate surface when grown on (200) oriented epi-RuO2on LaAlO3. The BSTO film consisted of a main body of stoichiometric bulk layer and a slightly oxygen deficiency region on the very film surface as revealed by Rutherford backscattering spectrometry. The dielectric constant of BSTO was above 400 at 10 kHz with zero dc electric field bias. A bias dc electric field modulation of the dielectric constant was observed to be more than 80% at 100 kHz at a field intensity of 6 × 105V/cm.

 

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