Determination of bulk states and interface states distributions in polycrystalline silicon thin‐film transistors
作者:
C. A. Dimitriadis,
D. H. Tassis,
N. A. Economou,
A. J. Lowe,
期刊:
Journal of Applied Physics
(AIP Available online 1993)
卷期:
Volume 74,
issue 4
页码: 2919-2924
ISSN:0021-8979
年代: 1993
DOI:10.1063/1.354648
出版商: AIP
数据来源: AIP
摘要:
The field‐effect conductance activation energyEaas a function of the gate voltageVgis investigated for polycrystalline silicon thin‐film transistors. An analytical expression forEais obtained for various models of the bulk and interface states. Using a computer minimization program to fit the experimentalEavsVgdata with the theory, the energy distribution of the bulk states and the interface states are separated for nonhydrogenated and hydrogenated polycrystalline silicon thin‐film transistors. In both cases, the bulk states have exponential band tails and a wide peak near the midgap and the interface states have an exponential distribution from the band edge.
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