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Reaction rates of D2+T2mixtures at 295 K

 

作者: G. T. McConville,   D. A. Menke,   R. E. Ellefson,  

 

期刊: Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films  （AIP Available online 1983）
卷期: Volume 1, issue 3  

页码: 1441-1446

 

ISSN:0734-2101

 

年代: 1983

 

DOI:10.1116/1.572037

 

出版商: American Vacuum Society

 

关键词: deuterium;tritium;vapor pressure;impurities;chemical reaction kinetics;deuterium tritides;chemical reaction yield;tritium oxides;quantity ratio;medium temperature;carbides

 

数据来源: AIP

 

摘要:

Reaction rates for the production of DT from D2+T2mixtures are reported as a function of pressure, initial T2concentration, and concentration of the impurity of CT4. The reactions took place in a specially constructed stainless steel container. The reactions are reproducible and can be explained in terms of the ion–molecule chain model of Thompson and Schaeffer. The presence of T2O as an impurity has no measurable effect at the measured concentration.

 

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