Ultrafast melting and resolidification on a (111) sufarce of a silicon crystal wafer, induced by 20‐ps pulses at 532‐nm wavelength, is accompanied by the emission of charged particles. This emission is studied as a function of pulse energy, in combination with time‐resolved reflectivity changes and post‐annealing morphology. The data provide evidence that thermalization time for a dense carrier plasma and the lattice is shorter than 10−11s.