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Diffusional relaxation and void growth in an aluminum interconnect of very large scale integration

 

作者: Masaharu Kato,   H. Niwa,   H. Yagi,   H. Tsuchikawa,  

 

期刊: Journal of Applied Physics  (AIP Available online 1990)
卷期: Volume 68, issue 1  

页码: 334-338

 

ISSN:0021-8979

 

年代: 1990

 

DOI:10.1063/1.347198

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Using the previously obtained stress distributions in an Al line after relaxation by plastic deformation, another possible relaxation process by diffusion was analyzed. Even after this relaxation occurs, some stresses still remain in the Al line. If these remaining stresses are large enough, they can be responsible for the growth of voids causing line failure. Using a theory for diffusional growth of grain‐boundary voids, the time to failure of the Al line was estimated analytically. The previous and present papers together constitute a full analysis of the so‐called ‘‘stress migration’’ phenomenon.

 

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