Annealing study of electron irradiation‐induced defects in SiGe alloys
作者:
J. J. Goubet,
D. Stievenard,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 66,
issue 11
页码: 1409-1411
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.113217
出版商: AIP
数据来源: AIP
摘要:
Isochronal annealing experiments on defects produced by 1.5 MeV electron irradiation at room temperature have been performed onn‐type SiGe alloys. Two defects have been studied, labeled P1 and P2, with associated energy levels located atEC−0.32 eV andEC−0.49 eV, respectively, and capture cross sections equal to 1×10−15cm2and 2×10−15cm2. P1 anneals out at 560 K and P2 at 470 K. A comparison with the defects known in Si and Ge allows us to propose the following identification: P1 is associated with the 0/− charge state of the divacancy (V–V)Siand P2 is associated with the 0/− charge state of theEcenter (P–VSi). ©1995 American Institute of Physics.
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