首页   按字顺浏览 期刊浏览 卷期浏览 Annealing study of electron irradiation‐induced defects in SiGe alloys
Annealing study of electron irradiation‐induced defects in SiGe alloys

 

作者: J. J. Goubet,   D. Stievenard,  

 

期刊: Applied Physics Letters  (AIP Available online 1995)
卷期: Volume 66, issue 11  

页码: 1409-1411

 

ISSN:0003-6951

 

年代: 1995

 

DOI:10.1063/1.113217

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Isochronal annealing experiments on defects produced by 1.5 MeV electron irradiation at room temperature have been performed onn‐type SiGe alloys. Two defects have been studied, labeled P1 and P2, with associated energy levels located atEC−0.32 eV andEC−0.49 eV, respectively, and capture cross sections equal to 1×10−15cm2and 2×10−15cm2. P1 anneals out at 560 K and P2 at 470 K. A comparison with the defects known in Si and Ge allows us to propose the following identification: P1 is associated with the 0/− charge state of the divacancy (V–V)Siand P2 is associated with the 0/− charge state of theEcenter (P–VSi). ©1995 American Institute of Physics.

 

点击下载:  PDF (71KB)



返 回