首页   按字顺浏览 期刊浏览 卷期浏览 C2column densities inH2/Ar/CH4microwave plasmas
C2column densities inH2/Ar/CH4microwave plasmas

 

作者: A. N. Goyette,   Y. Matsuda,   L. W. Anderson,   J. E. Lawler,  

 

期刊: Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films  (AIP Available online 1998)
卷期: Volume 16, issue 1  

页码: 337-340

 

ISSN:0734-2101

 

年代: 1998

 

DOI:10.1116/1.580992

 

出版商: American Vacuum Society

 

数据来源: AIP

 

摘要:

We report the observation of thed 3Πg→a 3ΠuSwan bands of theC2molecule both in absorption and emission in aH2/Ar/CH4microwave discharge plasma. The input mole fraction of methane is varied from 1% to 33%. From the observed absorptions, we calculate the column density of gas phaseC2.The calculated concentration ofC2is higher in discharges containing large fractions of argon than in discharges containing large fractions of hydrogen. These observations are useful in understanding the contribution of theC2molecule to the gas phase chemistry of the microwave plasma-assisted chemical vapor deposition of diamond.

 

点击下载:  PDF (107KB)



返 回