C2column densities inH2/Ar/CH4microwave plasmas
作者:
A. N. Goyette,
Y. Matsuda,
L. W. Anderson,
J. E. Lawler,
期刊:
Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films
(AIP Available online 1998)
卷期:
Volume 16,
issue 1
页码: 337-340
ISSN:0734-2101
年代: 1998
DOI:10.1116/1.580992
出版商: American Vacuum Society
数据来源: AIP
摘要:
We report the observation of thed 3Πg→a 3ΠuSwan bands of theC2molecule both in absorption and emission in aH2/Ar/CH4microwave discharge plasma. The input mole fraction of methane is varied from 1% to 33%. From the observed absorptions, we calculate the column density of gas phaseC2.The calculated concentration ofC2is higher in discharges containing large fractions of argon than in discharges containing large fractions of hydrogen. These observations are useful in understanding the contribution of theC2molecule to the gas phase chemistry of the microwave plasma-assisted chemical vapor deposition of diamond.
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