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Comments on ``Dependence of barrier height of metal‐semiconductor contact (Au&sngbnd;GaAs) on thickness of semiconductor surface layer''

 

作者: C. H. Wei,   S. S. Yee,  

 

期刊: Journal of Applied Physics  (AIP Available online 1974)
卷期: Volume 45, issue 2  

页码: 971-971

 

ISSN:0021-8979

 

年代: 1974

 

DOI:10.1063/1.1663356

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Experimental results on the dependence of the Au&sngbnd;GaAs barrier height on the thicknessdof the oxide film reported by Pruniaux and Adams indicate that &PHgr;B=&PHgr;i+Ad. This communication shows that neglecting the effect of surface states in the Cowley‐Sze model predicts a linear decrease of barrier height with increasing oxide thickness. The observed increase of barrier height with increasing oxide thickness may be partly due to surface states at the oxide‐semiconductor interface. A model that includes the effects of surface states and of screening on the metal side is proposed to explain the various values for &PHgr;i.

 

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