Comments on ``Dependence of barrier height of metal‐semiconductor contact (Au&sngbnd;GaAs) on thickness of semiconductor surface layer''
作者:
C. H. Wei,
S. S. Yee,
期刊:
Journal of Applied Physics
(AIP Available online 1974)
卷期:
Volume 45,
issue 2
页码: 971-971
ISSN:0021-8979
年代: 1974
DOI:10.1063/1.1663356
出版商: AIP
数据来源: AIP
摘要:
Experimental results on the dependence of the Au&sngbnd;GaAs barrier height on the thicknessdof the oxide film reported by Pruniaux and Adams indicate that &PHgr;B=&PHgr;i+Ad. This communication shows that neglecting the effect of surface states in the Cowley‐Sze model predicts a linear decrease of barrier height with increasing oxide thickness. The observed increase of barrier height with increasing oxide thickness may be partly due to surface states at the oxide‐semiconductor interface. A model that includes the effects of surface states and of screening on the metal side is proposed to explain the various values for &PHgr;i.
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