Self‐compensation of donors in high‐purity GaAs
作者:
C. M. Wolfe,
G. E. Stillman,
期刊:
Applied Physics Letters
(AIP Available online 1975)
卷期:
Volume 27,
issue 10
页码: 564-567
ISSN:0003-6951
年代: 1975
DOI:10.1063/1.88288
出版商: AIP
数据来源: AIP
摘要:
Column‐IV (Si, Ge, and Sn) and column‐VI (S, Se, and Te) impurities are used to dope high‐purity layers of vapor epitaxial GaAs. Resistivity and Hall data on a large number of samples show that the common donors in GaAs (assumed to be column‐IV impurities on gallium sites and column‐VI impurities on arsenic sites) are compensated by acceptor centers which are donor impurity‐vacancy complexes. These acceptor complexes are tentatively identified as column‐IV impurities on gallium sites associated with single gallium vacancies and column‐VI impurities on arsenic sites associated with single arsenic vacancies.
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