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Self‐compensation of donors in high‐purity GaAs

 

作者: C. M. Wolfe,   G. E. Stillman,  

 

期刊: Applied Physics Letters  (AIP Available online 1975)
卷期: Volume 27, issue 10  

页码: 564-567

 

ISSN:0003-6951

 

年代: 1975

 

DOI:10.1063/1.88288

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Column‐IV (Si, Ge, and Sn) and column‐VI (S, Se, and Te) impurities are used to dope high‐purity layers of vapor epitaxial GaAs. Resistivity and Hall data on a large number of samples show that the common donors in GaAs (assumed to be column‐IV impurities on gallium sites and column‐VI impurities on arsenic sites) are compensated by acceptor centers which are donor impurity‐vacancy complexes. These acceptor complexes are tentatively identified as column‐IV impurities on gallium sites associated with single gallium vacancies and column‐VI impurities on arsenic sites associated with single arsenic vacancies.

 

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