EFFECT OF PLASMA PROCESSING ON THE MORPHOLOGICAL EVOLUTION OF THIN FILMS
作者:
KRISHNA RAJAN,
M. NAEEM,
C. G. KALLINGAL,
期刊:
Chemical Engineering Communications
(Taylor Available online 1996)
卷期:
Volume 152-153,
issue 1
页码: 221-229
ISSN:0098-6445
年代: 1996
DOI:10.1080/00986449608936564
出版商: Taylor & Francis Group
关键词: Abnormal grain growth;Atomic force microscopy;Plasma processing;Perturbation analysis;Thin films;Transmission electron microscopy
数据来源: Taylor
摘要:
The effects of low energy plasma processing on the morphological evolution of copper thin films is examined using atomic force microscopy. It is shown that there appears to be a coupling between the shape evolution of the surface morphology of the thin film to the grain size evolution within the internal microstructure of the film. A linear perturbation model based on localized changes in grain boundary curvature due to preferential grain boundary grooving, is developed to couple the microstructural stability of thin films to dynamic effects due to processing parameters. It is suggested that prior grain size gradients existing in the as-deposited nature of the film have a significant effect on the grain size stability based on flow by mean curvature concepts. Based on this approach, a theoretical framework using the formalism of Fokker-Planck equations, to relate the stochastic nature of atomistic processes Such as plasma processing to the physics of grain growth are also proposed.
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