Oxidation of Si(100) in nitric oxide at low pressures: An x-ray photoelectron spectroscopy study
作者:
A. Kamath,
D. L. Kwong,
Y. M. Sun,
P. M. Blass,
S. Whaley,
J. M. White,
期刊:
Applied Physics Letters
(AIP Available online 1997)
卷期:
Volume 70,
issue 1
页码: 63-65
ISSN:0003-6951
年代: 1997
DOI:10.1063/1.119307
出版商: AIP
数据来源: AIP
摘要:
Ultrathin (8–23 Å) silicon oxynitrides have been studied in the temperature range of 560–1000 °C in 4 Torr of NO using a sequential growth and analysis approach. X-ray photoelectron spectroscopy indicates that with increasing growth temperature and time, a bonding structure with predominantly Si–O rather than Si–N formation is favored. Simultaneously, the average volume fraction of N (N/N+O) in the dielectric decreases, as a consequence of which the N1sbinding energy increases by 0.2–0.8 eV from its initial value of 397.8 eV at a thickness of 8 Å. A correlation of the electrical characteristics of NO grown oxynitrides with nitrogen content and location has been made. A film growth mechanism that takes into account the removal of previously incorporated N by NO is also proposed. ©1997 American Institute of Physics.
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