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Schottky‐barrier characteristics of metal–amorphous‐silicon diodes

 

作者: C. R. Wronski,   D. E. Carlson,   R. E. Daniel,  

 

期刊: Applied Physics Letters  (AIP Available online 1976)
卷期: Volume 29, issue 9  

页码: 602-605

 

ISSN:0003-6951

 

年代: 1976

 

DOI:10.1063/1.89158

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Metal–amorphous‐silicon Schottky barriers, similar to those used in thin‐film amorphous‐silicon solar cells, exhibit nearly ideal diode behavior in the dark. The current‐voltage characteristics have been studied in the range from 270 to 370 °K and are found to be in agreement with the diffusion theory of metal‐semiconductor rectification. Barrier heights, which were measured by two different methods, depend on the metal work function, and barriers as high as ∼1.1 eV are obtained with Pt films.

 

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