The influence of inversion domains on surface morphology in GaN grown by molecular beam epitaxy
作者:
L. T. Romano,
T. H. Myers,
期刊:
Applied Physics Letters
(AIP Available online 1997)
卷期:
Volume 71,
issue 24
页码: 3486-3488
ISSN:0003-6951
年代: 1997
DOI:10.1063/1.120367
出版商: AIP
数据来源: AIP
摘要:
Growth of GaN by rf-plasma molecular beam leads to different surface morphologies for nitrogen-rich growth versus gallium-rich growth. Nitrogen-rich growth produces a significant density of pyramidal hillocks while gallium-rich growth results in flat surfaces. Differences in surface morphology were directly linked to the presence of inversion domains which originated in the nucleation layer. Nitrogen-rich growth and growth under atomic hydrogen enhanced the growth rate of inversion domains with respect to the surrounding matrix, while growth under Ga-rich conditions resulted in a more nearly equal growth rate. ©1997 American Institute of Physics.
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