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The influence of inversion domains on surface morphology in GaN grown by molecular beam epitaxy

 

作者: L. T. Romano,   T. H. Myers,  

 

期刊: Applied Physics Letters  (AIP Available online 1997)
卷期: Volume 71, issue 24  

页码: 3486-3488

 

ISSN:0003-6951

 

年代: 1997

 

DOI:10.1063/1.120367

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Growth of GaN by rf-plasma molecular beam leads to different surface morphologies for nitrogen-rich growth versus gallium-rich growth. Nitrogen-rich growth produces a significant density of pyramidal hillocks while gallium-rich growth results in flat surfaces. Differences in surface morphology were directly linked to the presence of inversion domains which originated in the nucleation layer. Nitrogen-rich growth and growth under atomic hydrogen enhanced the growth rate of inversion domains with respect to the surrounding matrix, while growth under Ga-rich conditions resulted in a more nearly equal growth rate. ©1997 American Institute of Physics.

 

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