Overhead time associated with a work stage is an important factor determining the throughput of step‐and‐repeat‐type electron‐beam lithography systems. In addition to increasing stage speed, utilization of large field electron optics contributes to reduction of such overhead time. However, when using large field optics, the stage is required to have minimal yaw to prevent field stitching error. Accordingly, a high‐speed, high‐precision work stage with a piezodrive yaw correction function has been developed for construction of high‐throughput e‐beam systems. To avoid leakage, magnetic field variation, and vacuum contamination, only the work table is located in the vacuum chamber. The table is driven byX,Y‐drive mechanisms located outside the chamber. To achieve high speed positioning, a unique, light‐weightX‐Ytable structure using a PTFE slide bearing has been incorporated. To correct yaw error at the stage, the work table can be rotated ±8 arcsec with a piezoactuator. Positioning and yaw correction for the table are carried out with a closed‐loop control system that utilizes three‐axis (X,Y, and yaw) laser interferometers. A maximum velocity of 100 mm/s, ±2 μm positioning accuracy, 130 ms movement time including vibration settling for a 6.5 mm step, and a yaw of less than ±0.3 arcsec has been achieved.