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Particle track etch method for analysis op boron in silicon using 10B(n,∝)7L1 reaction

 

作者: S.K. Chakarvarti,   K.K. Nagpaul,  

 

期刊: Radiation Effects  (Taylor Available online 1981)
卷期: Volume 57, issue 5  

页码: 143-148

 

ISSN:0033-7579

 

年代: 1981

 

DOI:10.1080/01422448008228593

 

出版商: Taylor & Francis Group

 

数据来源: Taylor

 

摘要:

Boron bulk doped p-type (111) silicon thin wafers or different resistivities (1 − 100 ohm-cm ± 20%) have been analysed for boron using cellulose nitrate- Daicel and red dyed LR-115 tvpe II films as detectors of alpha particles from 10B(n,α)7Li reaction. The two detectors measure the same value of boron (∼0.1 ppm) in 1 ohm-cm silicon samples and agree closely with the four-point probe electrical resistivity measurement results whereas large discrepancies are observed in case of samples with resistivity >1 ohm-cm (B concent rat ion <0.1ppm) between the electrical measurements and the results obtained from the present technique. Also the results shown by the two types of detectors differ very much in case of samples with resistlvity>1 ohm-cm.

 

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