Particle track etch method for analysis op boron in silicon using 10B(n,∝)7L1 reaction
作者:
S.K. Chakarvarti,
K.K. Nagpaul,
期刊:
Radiation Effects
(Taylor Available online 1981)
卷期:
Volume 57,
issue 5
页码: 143-148
ISSN:0033-7579
年代: 1981
DOI:10.1080/01422448008228593
出版商: Taylor & Francis Group
数据来源: Taylor
摘要:
Boron bulk doped p-type (111) silicon thin wafers or different resistivities (1 − 100 ohm-cm ± 20%) have been analysed for boron using cellulose nitrate- Daicel and red dyed LR-115 tvpe II films as detectors of alpha particles from 10B(n,α)7Li reaction. The two detectors measure the same value of boron (∼0.1 ppm) in 1 ohm-cm silicon samples and agree closely with the four-point probe electrical resistivity measurement results whereas large discrepancies are observed in case of samples with resistivity >1 ohm-cm (B concent rat ion <0.1ppm) between the electrical measurements and the results obtained from the present technique. Also the results shown by the two types of detectors differ very much in case of samples with resistlvity>1 ohm-cm.
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