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Measurement of contact resistance of an ohmic contact applied to a high resistivity photoconductor

 

作者: V. K. Mathur,   C. S. Chang,   Chi H. Lee,  

 

期刊: Review of Scientific Instruments  （AIP Available online 1981）
卷期: Volume 52, issue 4  

页码: 616-618

 

ISSN:0034-6748

 

年代: 1981

 

DOI:10.1063/1.1136651

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A technique is described to estimate the contact resistance of an ohmic contact, under dynamic conditions, applied to a high resistivity photoconductor. It has been used to estimate the contact resistance of an ohmic contact (Au–Ge) applied to a semiinsulating Cr‐doped GaAs (p≊108W cm).

 

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