Contact Potential in Thin Metal Films
作者:
Stanley M. Bryla,
Charles Feldman,
期刊:
Journal of Applied Physics
(AIP Available online 1962)
卷期:
Volume 33,
issue 3
页码: 774-776
ISSN:0021-8979
年代: 1962
DOI:10.1063/1.1777166
出版商: AIP
数据来源: AIP
摘要:
Attempts were made to observe a work function variation with thickness of thin gold, platinum, and silver films. The films were vacuum deposited onto fused silica substrates at pressures of about 10−8torr. The vibrating capacitor method was used to measure the contact potential difference between the films and a platinum reference surface as a function of film resistance. The measurements were carried out at pressures of 10−8−10−10torr. The contact potential difference was found to be independent of film resistance in the range of 5 ohms/sq to 108ohms/sq.
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