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Contact Potential in Thin Metal Films

 

作者: Stanley M. Bryla,   Charles Feldman,  

 

期刊: Journal of Applied Physics  (AIP Available online 1962)
卷期: Volume 33, issue 3  

页码: 774-776

 

ISSN:0021-8979

 

年代: 1962

 

DOI:10.1063/1.1777166

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Attempts were made to observe a work function variation with thickness of thin gold, platinum, and silver films. The films were vacuum deposited onto fused silica substrates at pressures of about 10−8torr. The vibrating capacitor method was used to measure the contact potential difference between the films and a platinum reference surface as a function of film resistance. The measurements were carried out at pressures of 10−8−10−10torr. The contact potential difference was found to be independent of film resistance in the range of 5 ohms/sq to 108ohms/sq.

 

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