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High‐Field Magnetoresistance of Semiconductors and Plasmas. IV: Dependence on Inclusion Shape

 

作者: H. L. Frisch,   J. A. Morrison,  

 

期刊: Journal of Applied Physics  (AIP Available online 1965)
卷期: Volume 36, issue 4  

页码: 1399-1407

 

ISSN:0021-8979

 

年代: 1965

 

DOI:10.1063/1.1714318

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We have obtained exactly the excess dissipation due to a small spherical inclusion in a semiconductor, using the same model of the semiconductor which was investigated in previous papers of this series, and the ``four moment approximation'' to the electron‐distribution function. We have also calculated the high‐field limit of the transverse magnetoresistance for a dilute sprinkling of spherical inclusions, which is proportional to the high‐field limit of the excess dissipation, and varies as|H|asH→∞, whereHis the magnetic field. Previously, Herring obtained approximately the excess dissipation of a cylindrical inclusion with axis parallel to the magnetic field and made plausible a high‐field transverse magnetoresistance which varies as|H|/ln|H|asH→∞. In the case of spherical inclusion, we can investigate in detail perturbations produced by the external specimen boundaries, and we suggest that analogous results hold for a cylindrical inclusion.

 

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