High‐Field Magnetoresistance of Semiconductors and Plasmas. IV: Dependence on Inclusion Shape
作者:
H. L. Frisch,
J. A. Morrison,
期刊:
Journal of Applied Physics
(AIP Available online 1965)
卷期:
Volume 36,
issue 4
页码: 1399-1407
ISSN:0021-8979
年代: 1965
DOI:10.1063/1.1714318
出版商: AIP
数据来源: AIP
摘要:
We have obtained exactly the excess dissipation due to a small spherical inclusion in a semiconductor, using the same model of the semiconductor which was investigated in previous papers of this series, and the ``four moment approximation'' to the electron‐distribution function. We have also calculated the high‐field limit of the transverse magnetoresistance for a dilute sprinkling of spherical inclusions, which is proportional to the high‐field limit of the excess dissipation, and varies as|H|asH→∞, whereHis the magnetic field. Previously, Herring obtained approximately the excess dissipation of a cylindrical inclusion with axis parallel to the magnetic field and made plausible a high‐field transverse magnetoresistance which varies as|H|/ln|H|asH→∞. In the case of spherical inclusion, we can investigate in detail perturbations produced by the external specimen boundaries, and we suggest that analogous results hold for a cylindrical inclusion.
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