Growth of gallium arsenide on hydrogen passivated Si with low‐temperature treatment (∼600 °C)
作者:
S. F. Fang,
A. Salvador,
H. Morkoc¸,
期刊:
Applied Physics Letters
(AIP Available online 1991)
卷期:
Volume 58,
issue 17
页码: 1887-1889
ISSN:0003-6951
年代: 1991
DOI:10.1063/1.105063
出版商: AIP
数据来源: AIP
摘要:
Epitaxial growth of GaAs on Si commonly employs a high‐temperature (≳850 °C) oxide desorption step. In this letter, we report the first epitaxial growth of GaAs on Si without the need for this high‐temperature treatment. This method utilizes a final HF treatment whereby the Si surface dangling bonds are terminated by hydrogen with a resultant (1×1) bulk‐like surface structure. Upon medium temperature heat treatment (×500 °C), hydrogen leaves the surface leading to the common orthogonal 2×1 surface reconstruction. High quality GaAs epitaxial layers were successfully grown on these 2×1 reconstructed Si surfaces with the pregrowth substrate preparation temperatures of as low as 600 °C.
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