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Formation of a Schottky barrier between eutectic Ga,In and thiophene oligomers

 

作者: E. J. Lous,   P. W. M. Blom,   L. W. Molenkamp,   D. M. de Leeuw,  

 

期刊: Journal of Applied Physics  (AIP Available online 1997)
卷期: Volume 81, issue 8  

页码: 3537-3542

 

ISSN:0021-8979

 

年代: 1997

 

DOI:10.1063/1.364990

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The formation of a Schottky barrier between an eutectic (Ga,In) alloy and a highly doped thiophene oligomer is followed as a function of time using current density–voltage and capacitance–voltage measurements. Within 1 h, the diode characteristics change from almost nonrectifying, leaky behavior into a rectification ratio of104with a considerably reduced leakage current. Measurements and energy band diagram calculations show that the depletion width increases with time due to a decrease in the ionizable acceptor density of the semiconductor at the Schottky interface. This is probably caused by a chemical reaction between the in-diffusing metals and the doped oligomer. ©1997 American Institute of Physics.

 

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